Low-acceleration and High-density Ion Implanter


SOPHI-30, cluster-type low-acceleration and high-density ion implanter has no mass separator and supports thin wafers.


Cluster type

Thin wafer compatible.

No mass separator.


High throughput ion implanter with low acceleration and high density.

Half price as compared to conventional implanter.

⅓ the footprint of conventional implanter.



Power device manufacturing process, IGBT.

Wafer size: Up to 200mm.


Contact us for more product information and specifications.


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