Medium Current Ion Implanter SOPHI-200/260 : ULVAC Singapore

Medium Current Ion Implanter

SOPHI-200/260

This tool, SOPHI-200/260, basically inherits the existing medium current production model ion implanter and removes over specifications based on our sufficient experience as a tool supplier.

Therefore, thanks to effective cost reduction, we can offer inexpensive sales prices with parallel scan capability.

Features

	Applicable for 5-8 inch wafers.
	Compact and lightweight tool.
	Excellent parallel beam performance.
	Excellent for energy and metal contamination.
	Applicable for ultra-thin wafers.

Applications

	Ultra-thin wafers process such as power devices, etc.
	Research and Development.

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