Medium Current Ion Implanter


This tool, SOPHI-200/260, basically inherits the existing medium current production model ion implanter and removes over specifications based on our sufficient experience as a tool supplier.

Therefore, thanks to effective cost reduction, we can offer inexpensive sales prices with parallel scan capability.


Applicable for 5-8 inch wafers.

Compact and lightweight tool.

Excellent parallel beam performance.

Excellent for energy and metal contamination.

Applicable for ultra-thin wafers.



Ultra-thin wafers process such as power devices, etc.

Research and Development.


Contact us for more product information and specifications.


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