This is a batch-type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes the automated vacuum and deposition process.
It is recommended for Research and Development use as well as for small-scale manufacturing.
Supports various evaporation sources (i.e. EB, RH, EB + RH, etc). |
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Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc). |
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Supports various substrates; substrates size from Ø2in to 6in, rectangular substrates, Si, compounds, glass and ceramics. |
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Display and operation on LCD touch panel. |
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Superior PC-operating system and functions (recipe function, data logging, maintenance assist function). |
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Compound-related devices of Power devices. |
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LED, LD and high-speed devices. |
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Various R&Ds. |
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Other general electronic devices. |
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Contact us for more product information and specifications.