SME-200E is a cluster-type Sputtering system for research and development and production purposes.
Substrate size up to Ø200mm. |
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Process chamber up to three chambers can be equipped. |
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Available for various application-specific process modules. |
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Substrate heating mechanism, simultaneous deposition and revolved deposition are available. |
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Research & Development. |
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Production purpose. |
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Contact us for more product information and specifications.