Cluster-type Sputtering System


SME-200E is a cluster-type Sputtering system for research and development and production purposes.


Substrate size up to Ø200mm.

Process chamber up to three chambers can be equipped.

Available for various application-specific process modules.

Substrate heating mechanism, simultaneous deposition and revolved deposition are available.



Research & Development.

Production purpose.


Contact us for more product information and specifications.


2024 ULVAC Singapore Pte Ltd. All rights reserved.