Cluster-type Sputtering System

SME-200E

SME-200E is a cluster-type Sputtering system for research and development and production purposes.





Features

Substrate size up to Ø200mm.

Process chamber up to three chambers can be equipped.

Available for various application-specific process modules.

Substrate heating mechanism, simultaneous deposition and revolved deposition are available.

   

Applications

Research & Development.

Production purpose.

     



Contact us for more product information and specifications.

  




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