Multi-chamber Sputtering System
MLX™-3000N
MLX™-3000N meets customer’s complicated requests with superior process flexibility and controllability, and excellent cost performance.
MLX™-3000N meets customer’s complicated requests with superior process flexibility and controllability, and excellent cost performance.
Wafer size: 3 to 8 inches (75 to 200mm) |
||
Accurate film quality control is available with precise parameter control under a contaminated free environment |
||
Metallization for semiconductor devices such as Power devices, etc. |
||
Contact us for more product information and specifications.