Multi-chamber Sputtering System
ENTRON™-EX W300
ENTRON™-EX makes it possible to combine various state-of-the-art processes such as PVD, CVD, ALD and realizes a simple and robust In-Situ process.
ENTRON™-EX makes it possible to combine various state-of-the-art processes such as PVD, CVD, ALD and realizes a simple and robust In-Situ process.
ENTRON™-EX is the newest line-up developed based on the existing ENTRON™-W300/W200 series in order to achieve high productivity. |
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Up to 8 process chambers (PVD, ALD, CVD, etc.) and 2 chambers (Degas, cool). |
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Mechanical throughput is 100wph or more by using ULVAC's original new transfer robot. |
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ENTRON™-EX S-type (Single core type) is suitable for mini-fab concepts and ENTRON™-EX T-type (Tandem type) is good for mass production, they are flexible for customers' needs. |
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Advanced Semiconductor manufacturing equipment. |
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Contact us for more product information and specifications.