Substrate transfer capability up to Ø300mm (Deposition performance up to Ø200mm).

Automatic multi-layered deposition by recipe control.

Capable of automatic substrate transfer by simply loading the substrate on to manipulator in the Load-lock chamber.

Cassette chamber is available with five substrates stockers inside the load-lock chamber.

Co-sputtering and Multi-layer deposition using multi-cathodes.

Bias-sputtering was available with an optional substrate Bias power supply.

Research & Development.

Small production purpose.