High-Density Plasma Etching System for R&D


NE-550EX is a multi-purpose high-density plasma etching system, especially for test facilities such as universities and government agencies.


Equip with low-pressure, low-electron-temperature and high-density plasma sources.

Supports a wide range of process control from ion etching to radical etching.

Plasma density and uniformity can be controlled by optimizing the magnetic field.

Simple configuration makes maintenance easy.



Ultra-high frequency devices, optical devices (LEDs, LDs).

Next-generation non-volatile memory.

Biochips and microfluid devices.

Photonic crystals.

Sensors, MEMS (Micro-ElectroMechanical Systems).


Contact us for more product information and specifications.


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