High-Density Plasma Etching System for R&D
NE-550EX
NE-550EX is a multi-purpose high-density plasma etching system, especially for test facilities such as universities and government agencies.
NE-550EX is a multi-purpose high-density plasma etching system, especially for test facilities such as universities and government agencies.
Equip with low-pressure, low-electron-temperature and high-density plasma sources. |
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Supports a wide range of process control from ion etching to radical etching. |
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Plasma density and uniformity can be controlled by optimizing the magnetic field. |
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Simple configuration makes maintenance easy. |
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Ultra-high frequency devices, optical devices (LEDs, LDs). |
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Next-generation non-volatile memory. |
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Biochips and microfluid devices. |
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Photonic crystals. |
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Sensors, MEMS (Micro-ElectroMechanical Systems). |
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Contact us for more product information and specifications.