Load-lock Type Plasma-CVD System
CC-200
CC-200 is a compact and easy-to-use system for Research and Development use and production.
CC-200 is a compact and easy-to-use system for Research and Development use and production.
High-density plasma process on 27.12MHz |
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Supports the deposition of SiH4 (SiO2, SiNx, SiON, α-Si) and TEOS (SiO2). |
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Supports chamber cleaning by CF4+O2 plasma. |
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Supports the heater for low-temperature deposition of organic EL. |
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Supports various substrate sizes. |
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Vacuum box-enabled indirect sequential processing within C-series (Sputter : CS-200, Evaporation : CV-200). |
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Power devices. |
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Compound-related devices of LED, LD and high-speed devices. |
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Organic EL system for R&D use. |
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Solar battery system for R&D use. |
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MEMS. |
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