RF Power Supply

RMG Series


RMG-1303 is a 13.56 MHz, 300W output matching unit integrated RF power supply for use in plasma processes such as RF sputtering and plasma CVD etching.

The matching unit and RF power supply are integrated to achieve compactness and weight reduction.

It can be controlled at low output and can be used in a wide range of fields from research and development applications to mass production equipment.


Controllable from the low output of 1W.

Equipped with a pulse RF output function of 500Hz to 100KHz as standard.

Equipped with 13.56 MHz sync signal input / output terminals as standard for use during superimposed operation. (BNC terminal).

A wide range of single-phase 100V to 220V / 50Hz to 60Hz input is possible.

200mm x 200mm x 350mm / 10kg, compact and lightweight power supply.

Compatible with various standards, RoHS, CE, KC, SEMI-F47 compliant.



Sputtering and CVD equipment.

Plasma cleaning, etching and ashing equipment.

RF Ion Source and Neutralizer.


Contact us for more product information and specifications.


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