RF power supply for plasma process with 13.56 MHz, 0.5kW / 1kW / 3kW / 5kW output.
Compact and lightweight by implementing a high-efficiency RF amplifier.
RF power supply has a built-in auto-matching controller function, power control of the RF power supply and matching system control can be performed with the main unit alone.
Uses a high-efficiency amplifier. Energy savings through construction with an RF circuit featuring good power conversion efficiency. |
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Implements high-speed auto-matching with a high-speed algorithm. |
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RF power generator internally equipped with an auto-matching function. |
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Matching system control is possible with the power generator unit itself. Also capable of manual RF power generator and matching box operations with the internal controller. |
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Capable of external analog and serial communication control. |
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High reliability. Our accumulated knowledge as an equipment manufacturer has been reflected in the design. |
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Sputtering and CVD equipment. |
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Plasma etching equipment. |
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RF Ion Source and Neutralizer. |
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