MILA-5000 Series

50°C/s high speed heating.

Select the desired atmosphere from vacuum, gas, gas flow, air.

Precise temperature control.

Compact, table-top design.

Simple input of temperature recipe into computer connected with USB.

Display temperature data on the PC monitor during heating.

MILA-5000UHV

Heat treatment in an ultra-high vacuum atmosphere.

Handles up to 10-5 Pa (when using TMP).

Inherits the capabilities of the MILA-5000-P-N (high temperature type).

Compact, table-top design.

Simple input of temperature recipe into computer connected with USB.

Display temperature data on the PC monitor during heating.

MILA-5000 Series

Crystal annealing of ferroelectric thin films.

Diffusion annealing, oxide film deposition annealing after ion implantation.

Sintering, alloying treatment of Si and compound wafers.

Glass substrate uniform temperature annealing.

Thermal cycle, thermal shock, thermal fatigue testing.

Temperature programmed desorption testing, catalytic effect testing.

MILA-5000UHV

Heat treatment in an ultra-high vacuum.

Temperature-programmed desorption gas analyzing furnace.